DocumentCode
2615878
Title
Photoluminescence studies of anodic-oxide-induced intermixing of GaAs/AlGaAs quantum well heterostructures
Author
Burke, P.T. ; Gal, M. ; Yuan, Shu ; Kim, Yong ; Jagadish, C.
Author_Institution
Sch. of Phys., New South Wales Univ., Kensington, NSW, Australia
fYear
1996
fDate
8-11 Dec 1996
Firstpage
122
Lastpage
125
Abstract
A novel impurity-free interdiffusion technique, anodic-oxide-induced intermixing is demonstrated. A pulsed anodization of GaAs/AlGaAs quantum well heterostructures (QWH) with subsequent rapid thermal annealing (RTA) at 900°C, is studied. Blue shifts of up to 72meV have been observed by photoluminescence (PL) in intermixed samples with no significant broadening of the linewidth and good retention of PL intensity. The blueshift in the PL spectra is shown to increase with no sign of saturation with RTA times up to 120 seconds
Keywords
III-V semiconductors; aluminium compounds; anodisation; chemical interdiffusion; gallium arsenide; photoluminescence; rapid thermal annealing; semiconductor quantum wells; spectral line shift; 120 s; 900 C; GaAs-AlGaAs; GaAs/AlGaAs quantum well heterostructures; PL intensity retention; RTA; anodic-oxide-induced intermixing; blue shifts; impurity-free interdiffusion technique; photoluminescence; pulsed anodization; Atomic beams; Atomic layer deposition; Australia; Gallium arsenide; MOCVD; Measurement standards; Oxidation; Performance evaluation; Photoluminescence; Rapid thermal annealing;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials And Devices Proceedings, 1996 Conference on
Conference_Location
Canberra, ACT
Print_ISBN
0-7803-3374-8
Type
conf
DOI
10.1109/COMMAD.1996.610087
Filename
610087
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