The use and misuse of statistical process control in GaAs MMIC manufacture

Author

Warner, D.J. ; Lindsay, C.E. ; Sansom, C.L.

Author_Institution

GEC-Marconi Materials Technology Ltd., Towcester, UK

fYear

1993

fDate

10-13 Oct. 1993

Firstpage

131

Lastpage

133

Abstract

The application of statistical process control techniques intended for high volume continuous processes to the batch processes typical of GaAs MMIC manufacture can result in misleading data analysis. The moving range charting method has been successfully implemented for process control within the 3" fabrication facility. In addition, a revised method is presented for the assessment of process capability that takes into account the sampling strategy for data acquisition. Examples are given for both types of calculation. The introduction of control charting has allowed the quantity of in-process testing to be reduced, thus saving considerable time and expense.<>

Keywords

III-V semiconductors; MMIC; batch processing (industrial); flowcharting; gallium arsenide; integrated circuit manufacture; process control; quality control; statistical process control; GaAs; III-V semiconductor; MMIC manufacture; PROMIS CAM system; batch processes; control charting; data acquisition; moving range charting method; process capability; sampling strategy; statistical process control; wafer fabrication line; Computer aided manufacturing; Costs; Data analysis; Fabrication; Gallium arsenide; MMICs; Manufacturing processes; Materials science and technology; Process control; Semiconductor device manufacture;

fLanguage

English

Publisher

ieee

Conference_Titel

Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1993. Technical Digest 1993., 15th Annual

Conference_Location

San Jose, CA, USA

Print_ISBN

0-7803-1393-3

Type

conf

DOI

10.1109/GAAS.1993.394485

Filename

394485