Title :
Photolithography area dispatching scheme for advanced technology in foundry fabs
Author :
Hsu, Kuang-Huan ; Lan, Chieh-Chin
Author_Institution :
Taiwan Semicond. Manuf. Co., Taiwan
Abstract :
As advanced IC manufacturing technology processes become more complex and critical, the photo process specifications must be tightened to meet the design targets. For ⩽0.25 μm processes, most photo stages are limited to a dedicated tool, or even the same stepper, to get better overlay control. Dealing with process constraints and balancing tool loading inside the photo area effectively is a major challenge for advanced technology dispatching. In this paper, a photo-dispatching scheme for advanced technology production management in foundry fabs is developed to handle on-line dispatching. The proposed dispatching scheme can be divided into three parts: wafer start dispatching; dedicated tool management; and shop floor dispatching. This dispatching scheme not only automatically assigns a proper tool to each lot to meet the dedicated tool constraint and balance the tool loading, but also integrates with the local dispatching system to assist with shop floor dispatching. The proposed dispatching scheme has been proved to be useful for advanced technology mass production by testing in TSMC fab3
Keywords :
dispatching; integrated circuit manufacture; integrated circuit testing; photolithography; position control; production control; production testing; 0.25 micron; IC manufacturing technology; IC technology; automatic lot tool assignment; critical processes; dedicated tool; dedicated tool constraint; dedicated tool management; design targets; dispatching; dispatching scheme; foundry fabs; local dispatching system integration; mass production; on-line dispatching; overlay control; photo area; photo process specifications; photo stages; photo-dispatching scheme; photolithography area dispatching scheme; process complexity; process constraints; production testing; shop floor dispatching; stepper; technology production management; tool loading; tool loading balancing; wafer start dispatching; Computer aided manufacturing; Dispatching; Foundries; Lithography; Manufacturing processes; Mass production; Operations research; Production management; Semiconductor device manufacture; Semiconductor device testing;
Conference_Titel :
Semiconductor Manufacturing Technology Workshop, 2000
Conference_Location :
Hsinchu
Print_ISBN :
0-7803-6374-4
DOI :
10.1109/SMTW.2000.883098
