13.2 A 14nm FinFET 128Mb 6T SRAM with VMIN-enhancement techniques for low-power applications

With the explosive growth of battery-operated portable devices, the demand for low power and small size has been increasing for system-on-a-chip (SoC). The FinFET is considered as one of the most promising technologies for future low-power mobile applications because of its good scaling ability, high on-current, better SCE and subthreshold slope, and small leakage current [1]. As a key approach for low-power, supply-voltage (V_DD) scaling has been widely used in SoC design. However, SRAM is the limiting factor of voltage-scaling, since all SRAM functions of read, write, and hold-stability are highly influenced by increased variations at low V_DD, resulting in lower yield. In addition, the width-quantization property of FinFET device reduces the design window for transistor sizing, and increases the failure probability due to the un-optimized bitcell sizing [1]. In order to overcome the bitcell challenges to high yield, peripheral-assist techniques are required. In this paper, we present 14nm FinFET-based 128Mb 6T SRAM chips featuring low-V_MIN with newly developed assist techniques.