DocumentCode
2624584
Title
Eigenfeatures for planar pose measurement of partially occluded objects
Author
Krumm, John
Author_Institution
Intelligent Syst. & Robotics Centre, Sandia Nat. Labs., Albuquerque, NM, USA
fYear
1996
fDate
18-20 Jun 1996
Firstpage
55
Lastpage
60
Abstract
Planar pose measurement from images is an important problem for automated assembly and inspection. In addition to accuracy and robustness, ease of use is very important for real world applications. Recently, Murase and Nayar have presented the “parametric eigenspace ” for object recognition and pose measurement based on training images. Although their system is easy to use, it has potential problems with background clutter and partial occlusions. We present an algorithm that is robust in these terms. It uses several small features on the object rather than a monolithic template. These “eigenfeatures” are matched using a median statistic, giving the system robustness in the face of background clutter and partial occlusions. We demonstrate our algorithm´s pose measurement accuracy with a controlled test, and we demonstrate its detection robustness on cluttered images with the objects of interest partially occluded
Keywords
assembling; automatic optical inspection; clutter; eigenvalues and eigenfunctions; object recognition; automated assembly; clutter; eigenfeatures; inspection; median statistic; object recognition; parametric eigenspace; partially occluded objects; planar pose measurement; real world applications; robustness; training images; Assembly; Cameras; Computer vision; Inspection; Intelligent robots; Laboratories; Machine vision; Object detection; Object recognition; Robustness;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer Vision and Pattern Recognition, 1996. Proceedings CVPR '96, 1996 IEEE Computer Society Conference on
Conference_Location
San Francisco, CA
ISSN
1063-6919
Print_ISBN
0-8186-7259-5
Type
conf
DOI
10.1109/CVPR.1996.517053
Filename
517053
Link To Document