• DocumentCode
    2628227
  • Title

    Characteristics of Pd-poly crystalline 3C-SiC Schottky diodes for high temperature H2 microsensors

  • Author

    Ahn, Jeong-Hak ; Yoon, Kyu-Hyung ; Chung, Gwiy-Sang

  • Author_Institution
    Univ. of Ulsan, Ulsan
  • fYear
    2008
  • fDate
    23-29 June 2008
  • Firstpage
    202
  • Lastpage
    204
  • Abstract
    In this paper, poly 3C-SiC thin films were grown on SiO2/Si by atmospheric pressure chemical vapor deposition (APCVD) using HMDS, H2, and Ar gas at 1100 for 30 min, respectively. And then, palladium films were deposited on poly 3C-SiC by RF magnetron sputter. Thickness, uniformity, and quality of these samples were performed by SEM. Crystallinity and orientationation of palladium were analyzed by XRD. Pd/poly 3C-SiC Schottky diodes were fabricated and characterized by current-voltage measurements. From results, Pd/poly 3C-SiC devices are promising for high temperature hydrogen sensor and application.
  • Keywords
    Schottky diodes; X-ray diffraction; chemical vapour deposition; microsensors; palladium; scanning electron microscopy; silicon compounds; temperature sensors; thin film sensors; wide band gap semiconductors; Pd-SiC; Schottky diodes; XRD; atmospheric pressure chemical vapor deposition; current-voltage measurements; high temperature hydrogen sensor; high temperature microsensors; palladium films; Argon; Chemical vapor deposition; Crystallization; Magnetic analysis; Palladium; Radio frequency; Schottky diodes; Semiconductor thin films; Sputtering; Temperature sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Strategic Technologies, 2008. IFOST 2008. Third International Forum on
  • Conference_Location
    Novosibirsk-Tomsk
  • Print_ISBN
    978-1-4244-2319-4
  • Electronic_ISBN
    978-1-4244-2320-0
  • Type

    conf

  • DOI
    10.1109/IFOST.2008.4602854
  • Filename
    4602854