DocumentCode
2631613
Title
Integrable planar photonic crystal devices in silicon using nonlinear effects
Author
Reinke, Charles M. ; Jafarpour, Ashkan ; Jiandong Huang ; Soltani, Mahdi ; Momeni, B. ; Adibi, Ali
Author_Institution
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2005
fDate
22-28 Oct. 2005
Firstpage
229
Lastpage
230
Abstract
This paper is focused on nonlinear photonic crystal (PC) structures from theoretical, fabrication, and practical points of views. The material platform for these structures is Si photonic crystals (fabricated using electron beam lithography and dry etching) infiltrated with nonlinear optical polymers. A two-dimensional finite-difference time-domain (FDTD) simulation tool based on a modification of the original Yee´s FDTD algorithm is developed.
Keywords
electron beam lithography; elemental semiconductors; etching; finite difference time-domain analysis; nonlinear optics; optical polymers; photonic crystals; silicon; Si; Si photonic crystals; dry etching; electron beam lithography; infiltrated; nonlinear effects; nonlinear optical polymers; planar photonic crystal devices; silicon; two-dimensional finite-difference time-domain; Crystalline materials; Dry etching; Electron beams; Finite difference methods; Lithography; Optical device fabrication; Optical materials; Photonic crystals; Silicon; Time domain analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2005. LEOS 2005. The 18th Annual Meeting of the IEEE
Print_ISBN
0-7803-9217-5
Type
conf
DOI
10.1109/LEOS.2005.1547954
Filename
1547954
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