DocumentCode :
2633023
Title :
Reliability study of magnetic tunnel junction with naturally oxidized MgO barrier
Author :
Yoshida, Chikako ; Sugii, Toshihiro
Author_Institution :
Low-power Electron. Assoc. & Project, Tsukuba, Japan
fYear :
2012
fDate :
15-19 April 2012
Abstract :
We examined the breakdown characteristics of naturally oxidized MgO barriers using a time dependent dielectric breakdown (TDDB) technique. We found that the positive bias dependence of the breakdown time can be explained using the E-model and negative bias dependence can be explained using the power-law model. This asymmetric nature of the oxidized MgO barrier was due to unoxidized Mg metal at the reference/barrier interface. We also estimated the lifetime expansion under pulse voltage stress by taking the Joule heating effects into account.
Keywords :
MRAM devices; electric breakdown; magnesium compounds; magnetic tunnelling; oxidation; reliability; Joule heating effect; MgO; breakdown characteristics; magnetic tunnel junction; naturally oxidized barrier; negative bias dependence; positive bias dependence; power law model; pulse voltage stress; reference-barrier interface; reliability; time dependent dielectric breakdown technique; Electric breakdown; Heating; Magnetic tunneling; Oxidation; Stress; Temperature measurement; Voltage measurement; MTJ; MgO barrier; TDDB; natural oxidation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2012 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4577-1678-2
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2012.6241773
Filename :
6241773
Link To Document :
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