• DocumentCode
    2633106
  • Title

    Reliability of AlGaN/GaN HEMTs; An overview of the results generatedunder the ONR DRIFT program

  • Author

    Mishra, Umesh K.

  • Author_Institution
    Univ. of California, Santa Barbara, CA, USA
  • fYear
    2012
  • fDate
    15-19 April 2012
  • Abstract
    Under the ONR DRIFT program a large amount of coordinated work from some of the best groups in the US and Europe has resulted in an unprecedented level of understanding of the degradation mechanisms in AlGaN/GaN HEMTs. The scope of the program is vast and so in this paper only some of the methodologies employed and outcomes of the research will be summarized.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device reliability; wide band gap semiconductors; AlGaN-GaN; Europe; HEMT reliability; ONR DRIFT program; US; high electron mobility transistors; Aluminum gallium nitride; Degradation; Educational institutions; Gallium nitride; HEMTs; MODFETs; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2012 IEEE International
  • Conference_Location
    Anaheim, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4577-1678-2
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2012.6241778
  • Filename
    6241778