DocumentCode :
2633434
Title :
Exploration of VLSI CAD researches for early design rule evaluation
Author :
Park, Chul-Hong ; Pan, David Z. ; Lucas, Kevin
Author_Institution :
Semicond. R&D Center, Samsung Electron., Yongin, South Korea
fYear :
2011
fDate :
25-28 Jan. 2011
Firstpage :
405
Lastpage :
406
Abstract :
Design rule has been a primary metric to link design and technology, and is likely to be considered as IC manufacturer´s role for the generation due to the empirical and unsystematic in nature. Disruptive and radical changes in terms of layout style, lithography and device in the next decade require the design rule evaluation in early development stage. In this paper, we explore VLSI CAD researches for early and systematic evaluation of design rule, which will be a key technique for enhancing the competitiveness in IC market.
Keywords :
VLSI; lithography; technology CAD (electronics); VLSI CAD; design rule evaluation; lithography; Design automation; Layout; Lithography; Performance evaluation; Routing; Solid modeling; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference (ASP-DAC), 2011 16th Asia and South Pacific
Conference_Location :
Yokohama
ISSN :
2153-6961
Print_ISBN :
978-1-4244-7515-5
Type :
conf
DOI :
10.1109/ASPDAC.2011.5722223
Filename :
5722223
Link To Document :
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