• DocumentCode
    2633464
  • Title

    HCI vs. BTI? - Neither one´s out

  • Author

    Schlunder, Christian ; Aresu, Stefano ; Georgakos, Georg ; Kanert, W. ; Reisinger, H. ; Hofmann, Klaus ; Gustin, Wolfgang

  • Author_Institution
    Corp. Reliability Dept., Infineon Technol. AG, Neubiberg, Germany
  • fYear
    2012
  • fDate
    15-19 April 2012
  • Abstract
    In the development of MOSFETs first `Hot Carrier Injection´ (HCI) played an important role for reliability aspects [1,2]. With new shrinked process generations and nitrided gate oxides additionally the `Bias Temperature Instability´ (BTI) raised and became the most critical mechanism. Some publications even claim that HCI is negligible in main-stream applications [3-6]. But is this statement generally true or is it the result of a partial view? This paper will discuss the area of conflict regarding the importance of N/PBTI and HCI. Some typical examples will illuminate different fields of applications with one dominating damage mechanism. Specific characteristics of these circuits and operation conditions leading to an outbalance of HCI or Negative-/Positive-BTI will be carved out. Finally it will be evaluated if a general trend is observable.
  • Keywords
    MOSFET; circuit stability; hot carriers; semiconductor device reliability; HCI; MOSFET; N/PBTI; bias temperature instability; hot carrier injection; negative-/positive-BTI; nitrided gate oxides; reliability aspect; shrinked process generation; Degradation; Hot carriers; Human computer interaction; Logic gates; MOSFETs; Reliability; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2012 IEEE International
  • Conference_Location
    Anaheim, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4577-1678-2
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2012.6241797
  • Filename
    6241797