DocumentCode :
2633615
Title :
Back-end dielectrics reliability under unipolar and bipolar AC-stress
Author :
Chery, E. ; Federspiel, X. ; Beylier, G. ; Besset, C. ; Roy, D. ; Volpi, F. ; Chaix, J.-M.
Author_Institution :
STMicroelectron., Crolles, France
fYear :
2012
fDate :
15-19 April 2012
Abstract :
The present paper compares the effects of AC and DC electrical stress on low-κ SiOCH and high-κ ZrO2 and Ta2O5 back-end dielectrics. A wide panel of stress conditions has been assessed, mixing DC, unipolar/bipolar and relaxation times. The DC-stress being the reference stress condition, no enhancement of the time-to-breakdown (TBD) has been found with pure bipolar stress. On the contrary unipolar stress showed a strong improvement of this characteristic. We propose that the lifetime enhancement is due to a charge detrapping mechanism within the dielectric that affects the defect density. Under unipolar- and relax-bipolar-stress the time-to-breakdown has been corrected by the duty cycle in order to consider the effective duration of the stress. In this study no impact of copper has been found on the breakdown behaviour.
Keywords :
dielectric devices; dielectric relaxation; electric breakdown; integrated circuit interconnections; integrated circuit reliability; silicon compounds; stress effects; tantalum compounds; zirconium compounds; AC electrical stress; DC electrical stress; SiOCH; TBD; Ta2O5; ZrO2; back-end dielectrics reliability; bipolar AC-stress; bipolar stress; breakdown behaviour; charge detrapping mechanism; defect density; duty cycle; high-κ back-end dielectrics; lifetime enhancement; low-κ back-end dielectrics; reference stress condition; relax-bipolar-stress; relaxation times; stress conditions; time-to-breakdown; unipolar AC-stress; unipolar stress; unipolar-bipolar-stress; Capacitance; Charge carrier processes; Dielectrics; Electric breakdown; Materials; Stress; Temperature; Low-k dielectrics; MTTF; Metal-Insulator-Metal; TDDB; Trapping;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2012 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4577-1678-2
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2012.6241804
Filename :
6241804
Link To Document :
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