• DocumentCode
    2636199
  • Title

    On the frequency dependence of the bias temperature instability

  • Author

    Grasser, T. ; Kaczer, B. ; Reisinger, H. ; Wagner, P.-J. ; Toledano-Luque, M.

  • Author_Institution
    Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
  • fYear
    2012
  • fDate
    15-19 April 2012
  • Abstract
    An accurate understanding of the duty-factor and frequency dependence of the bias temperature instability (BTI) is essential since it can transfer to significant lifetime benefits. Contradictory reports regarding the frequency dependence have been published in literature, with particularly older studies and those interpreted in the framework of the reaction-diffusion model claiming BTI to be frequency-independent. Newer studies, on the other hand, clearly show a frequency-dependent component of BTI. Here we discuss this frequency dependence using the recently suggested capture/emission time map model, which explains BTI as a collection of a large number of independent first-order reactions of defects with two states. While this model can explain most features observed in DC and low-frequency AC stress experiments, it does not fully capture the experimentally observed frequency and duty-factor dependence. However, when a more accurate defect model is considered, which describes charging of the defect via an intermediate state, good accuracy with experimental data is obtained.
  • Keywords
    semiconductor device models; semiconductor device reliability; AC stress; DC stress; bias temperature instability; duty-factor; frequency dependence; lifetime benefits; reaction-diffusion model; Charge carrier processes; Data models; Degradation; Frequency dependence; Merging; Predictive models; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2012 IEEE International
  • Conference_Location
    Anaheim, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4577-1678-2
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2012.6241938
  • Filename
    6241938