Digital image processing applied to imaging interferometric lithography

Author

Magotra, Neeraj ; Divakar, Sriram ; Tu, Chengiie ; Brueck, S.R.J. ; Chen, Xiaolan

Author_Institution

Dept. of Electr. & Comput. Eng., New Mexico Univ., Albuquerque, NM, USA

Volume

2

fYear

1998

fDate

1-4 Nov. 1998

Firstpage

989

Abstract

Over the past several decades, progress in VLSI technology has been characterized by an ever-decreasing feature size with optical lithography being the dominant manufacturing technique. Optical lithography is about to enter the fundamentally new regime of printing dense features at dimensions appreciably smaller than the wavelength. Imaging interferometric lithography (IIL) has been introduced as an innovative and powerful approach to optical lithography to realize this promise. IIL is based on a detailed understanding of the ultimate capabilities of optical lithography derived from a spatial frequency space perspective. This paper describes the application of digital image processing techniques in the Fourier domain applied to IIL.

Keywords

Fourier analysis; VLSI; image processing; integrated circuit manufacture; integrated circuit technology; photolithography; Fourier domain; VLSI technology; dense features printing; digital image processing; feature size; imaging interferometric lithography; manufacturing technique; optical lithography; spatial frequency space; wavelength; Computer aided manufacturing; Digital images; Frequency; Interferometric lithography; Manufacturing processes; Nonlinear optics; Optical computing; Optical imaging; Optical interferometry; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Signals, Systems & Computers, 1998. Conference Record of the Thirty-Second Asilomar Conference on

Conference_Location

Pacific Grove, CA, USA

ISSN

1058-6393

Print_ISBN

0-7803-5148-7

Type

conf

DOI

10.1109/ACSSC.1998.751411

Filename

751411