DocumentCode :
2642355
Title :
The impact of narrow width effects on high frequency performance and noise in 35nm multi-finger n-MOSFETs
Author :
Yeh, Kuo-Liang ; Chang, Chih-Shiang ; Guo, Jyh-Chyurn
Author_Institution :
Inst. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fYear :
2012
fDate :
17-19 June 2012
Firstpage :
355
Lastpage :
358
Abstract :
The impact of narrow width effects on high frequency performance parameters like fT, fMAX, and RF noise in 35nm multi-finger n-MOSFETs is investigated in this paper. Multi-OD devices with extremely narrow width and fixed finger number (NF) reveal higher Rg and Cgg, which lead to the penalty in fT, fMAX, and NFmin. On the other hand, narrow-OD MOSFET with larger NF can yield lower Rg and higher fMAX. However, these narrow-OD devices even with lower Rg suffer lower fT and higher NFmin. The mechanisms responsible for narrow width effects on fT, fMAX, and noise parameters will be addressed to provide an important guideline of MOSFET layout for RF circuits design using nanoscale CMOS technology.
Keywords :
CMOS integrated circuits; MOSFET; nanoelectronics; radiofrequency integrated circuits; MOSFET layout; RF circuits design; fMAX; fixed finger number; high frequency performance parameters; multiOD devices; multifinger n-MOSFET; nanoscale CMOS technology; narrow width effects; narrow-OD MOSFET; narrow-OD devices; noise parameters; size 35 nm; Degradation; MOS devices; MOSFET circuits; Noise; Noise measurement; Radio frequency; Standards; NFmin; Nanoscale CMOS; fMAX; fT; high frequency; multi-finger; narrow width;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radio Frequency Integrated Circuits Symposium (RFIC), 2012 IEEE
Conference_Location :
Montreal, QC
ISSN :
1529-2517
Print_ISBN :
978-1-4673-0413-9
Electronic_ISBN :
1529-2517
Type :
conf
DOI :
10.1109/RFIC.2012.6242298
Filename :
6242298
Link To Document :
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