Title :
Peering through the technology scaling fog
Author_Institution :
Components Res., Intel Corp., Hillsboro, OR, USA
Abstract :
While walking in the fog, the path nearest you is relatively clear and then options broaden and become less clear as you peer further away. This paper will discuss which parts of the technology path forward are predictable and where inflection points may occur which require doing things differently. It is clear that many choices will need to be made in the next few years to be ready for technology in 2020 and beyond.
Keywords :
CMOS integrated circuits; integrated circuit interconnections; CMOS; inflection point; integration; interconnects; technology path forward; technology scaling fog; CMOS integrated circuits; Computer architecture; Dielectrics; Logic gates; Performance evaluation; Silicon; CMOS; NRI; devices; integration; interconnects;
Conference_Titel :
VLSI Technology (VLSIT), 2012 Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4673-0846-5
Electronic_ISBN :
0743-1562
DOI :
10.1109/VLSIT.2012.6242434
