Title :
A highly pitch scalable 3D vertical gate (VG) NAND flash decoded by a novel self-aligned independently controlled double gate (IDG) string select transistor (SSL)
Author :
Chen, Chih-Ping ; Lue, Hang-Ting ; Chang, Kuo-Pin ; Hsiao, Yi-Hsuan ; Hsieh, Chih-Chang ; Chen, Shih-Hung ; Shih, Yen-Hao ; Hsieh, Kuang-Yeu ; Yang, Tahone ; Chen, Kuang-Chao ; Lu, Chih-Yuan
Author_Institution :
Emerging Central Lab., Macronix Int. Co., Ltd., Hsinchu, Taiwan
Abstract :
Despite vertical stacking, the lateral scaling of 3D NAND Flash is critically important because otherwise >;16 stacking layers are needed to be cost competitive to 20nm 2D NAND. In this work, we propose a 3D vertical gate (VG) NAND using a self-aligned independently controlled double gate (IDG) string select transistor (SSL) decoding method. The IDG SSL provides excellent program inhibit and read selection without any penalty of cell size increase, making our 3D VG NAND cell as scalable as conventional 2D NAND. We present the world´s first <; 50nm (37.5nm) half-pitch 3D NAND. The BL decoding and page operation methods are illustrated in detail. This highly pitch scalable VG with IDG SSL approach provides a very cost competitive 3D NAND.
Keywords :
NAND circuits; flash memories; thin film transistors; 2D NAND; 3D VG NAND cell; BL decoding; IDG-SSL decoding method; half-pitch TFT devices; highly pitch scalable 3D vertical gate NAND flash memory; page operation methods; self-aligned independently controlled double gate string select transistor; size 20 nm; Arrays; Decoding; Layout; Logic gates; Thin film transistors; Very large scale integration;
Conference_Titel :
VLSI Technology (VLSIT), 2012 Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4673-0846-5
Electronic_ISBN :
0743-1562
DOI :
10.1109/VLSIT.2012.6242476