DocumentCode
2644452
Title
Period doubling and chaotic phenomena in homogenous dielectric-barrier discharge at atmospheric pressure a)
Author
Wang, Y.H. ; Zhang, Y.T. ; Wang, D.Z. ; Kong, M.G.
Author_Institution
Dept. of Phys., Dalian Univ. of Technol.
fYear
2006
fDate
4-8 June 2006
Firstpage
32
Lastpage
32
Abstract
Summary form only given. Plasma is a typical nonlinear dynamical system with a large number of degrees of freedom, which can exhibit a rich variety of dynamical behaviors. It is known that a lot of nonlinear dynamic phenomena, such as periodic doubling bifurcation, intermittency, quasiperiodicity, and chaos, have been observed and studied experimentally and numerically in driven or undriven plasma discharge system. In this paper, we investigate the nonlinear dynamical behaviors of homogenous dielectric-barrier discharge at atmospheric pressure based on a one-dimensional fluid model. We find that, under certain conditions, a very clear period-doubling sequence to chaos can be obtained. Moreover, several periodic windows embedded in chaos, including period 3, period 5 and period 7, as well as the secondary bifurcation occurring in the periodic windows can also been observed. These behaviors should be attributed to the existence of negative differential resistance in homogenous dielectric-barrier discharge at atmospheric pressure. In addition, the discharge characteristics and spatial structures after entering bifurcation states are also investigated and discussed
Keywords
bifurcation; chaos; discharges (electric); nonlinear dynamical systems; plasma nonlinear processes; plasma transport processes; atmospheric pressure; chaos; degrees of freedom; homogenous dielectric-barrier discharge; intermittency; negative differential resistance; nonlinear dynamical system; one-dimensional fluid model; periodic doubling bifurcation; plasma discharge; quasiperiodicity; Bifurcation; Chaos; Dielectric materials; Electron beams; Laboratories; Laser theory; Nonlinear dynamical systems; Optical materials; Physics; Plasma materials processing;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
Conference_Location
Traverse City, MI
Print_ISBN
1-4244-0125-9
Type
conf
DOI
10.1109/PLASMA.2006.1706904
Filename
1706904
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