DocumentCode :
2644630
Title :
Continuous characterization of MOSFET from low-frequency noise to thermal noise using a novel measurement system up to 100 MHz
Author :
Ohmori, Kenji ; Hasunuma, Ryu ; Feng, Wei ; Yamada, Keisaku
Author_Institution :
Grad. Sch. of Pure & Appl. Sci., Univ. of Tsukuba, Tsukuba, Japan
fYear :
2012
fDate :
12-14 June 2012
Firstpage :
143
Lastpage :
144
Abstract :
We have developed a novel system for characterizing higher-frequency noise properties of MOSFETs under DC-biases up to 100 MHz. A low-noise amplifier (LNA) was mounted on a unique micro probe-card so that the signal from DUT (on a wafer) is captured with lesser losses. Using this new approach, we have successfully demonstrated the transition of low-frequency (LF) noise to high-frequency (HF) noise, such as thermal noise. In addition, the change in the factors of noise results in lowing the standard variation of noise in a HF region, where intrinsic phenomena derived from the channel conductance play a key roll.
Keywords :
MOSFET; low noise amplifiers; semiconductor device measurement; semiconductor device noise; thermal noise; MOSFET; channel conductance; high-frequency noise; higher-frequency noise properties; low-frequency noise; low-noise amplifier; measurement system; thermal noise; unique micro probe-card; FETs; Frequency measurement; Hafnium oxide; Logic gates; Noise; Resistance; Thermal noise; MOSFET; RF; Si; high-k dielectrics; low-frequency (1/ƒ) noise; low-noise amplifier; thermal noise;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology (VLSIT), 2012 Symposium on
Conference_Location :
Honolulu, HI
ISSN :
0743-1562
Print_ISBN :
978-1-4673-0846-5
Electronic_ISBN :
0743-1562
Type :
conf
DOI :
10.1109/VLSIT.2012.6242502
Filename :
6242502
Link To Document :
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