DocumentCode :
2646309
Title :
Effects Of Secondary Electron Emission on DC plasma source sheaths
Author :
Ordonez, Camilo ; Carrera ; Mohanti, R. ; Montalvo
Author_Institution :
Valley Research Corporation
fYear :
1993
fDate :
1-3 June 1993
Firstpage :
101
Lastpage :
101
Keywords :
Electron emission; Plasma applications; Plasma density; Plasma devices; Plasma immersion ion implantation; Plasma materials processing; Plasma sheaths; Plasma sources; Plasma temperature; Plasma transport processes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
Type :
conf
DOI :
10.1109/PLASMA.1992.697795
Filename :
697795
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2646309
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