DocumentCode :
2646310
Title :
Design-manufacturing interface. I. Vision [VLSI]
Author :
Maly, W. ; Heineken, H.T. ; Khare, J. ; Nag, P.K.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear :
1998
fDate :
23-26 Feb 1998
Firstpage :
550
Lastpage :
556
Abstract :
This paper proposes a vision for a new research domain emerging on the interface between design and manufacturing of VLSI circuits. The key objective of this domain is the minimization of the mismatch between design and manufacturing which is rapidly growing with the increase in complexity of VLSI designs and IC technologies. This broad objective is partitioned into a number of specific tasks. Often, one of the most important tasks is the extraction of VLSI design attributes that may be relevant from a manufacturing efficiency standpoint. The second task is yield analysis performed to detect process and design attributes responsible for inadequate yield. This paper postulates both, an overall change in the design-manufacturing interface, as well as a methodology to address the growing design-manufacturing mismatch. Attributes of a number of tools needed for this purpose are discussed as well
Keywords :
VLSI; design for manufacture; integrated circuit design; integrated circuit manufacture; integrated circuit yield; VLSI design; VLSI manufacture; design-manufacturing interface; yield analysis; Circuits; Fabrication; Manufacturing processes; Minimization; Performance analysis; Process design; Product design; Pulp manufacturing; Timing; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Automation and Test in Europe, 1998., Proceedings
Conference_Location :
Paris
Print_ISBN :
0-8186-8359-7
Type :
conf
DOI :
10.1109/DATE.1998.655912
Filename :
655912
Link To Document :
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