• DocumentCode
    2646834
  • Title

    A high repetition rate multi-pulse discharge power for heating plasma

  • Author

    Jiang, Baocai ; Lin, Wenzheng

  • Author_Institution
    Shanghai Inst. of Opt. & Fine Mech., Chinese Acad. of Sci.
  • fYear
    2006
  • fDate
    4-8 June 2006
  • Firstpage
    159
  • Lastpage
    159
  • Abstract
    Summary form only given. In this paper, a high repetition rate and multi-pulse discharge power is reported, which can be used to heating plasma. The discharge width, repetition rate and the number of pulse can be adjusted. This power allows us to give higher mean power and very high peak power in short duration with small power supply. In many applications of interest, it will be advantageous to use this multi-pulse circuit. This power consists of several storage capacitors (C1, C2, ..., Cn), switches (S1, S2, ..., Sn), and one high voltage power (H.V). Every capacitor is connected in series with relevant switch respectively and forms many discharge circuits. These circuits are connected in parallel with the same load (plasma). The plasma is pre-ionized by H.V and kept on "simmer" state. The capacitors (C1, C2, ..., Cn) are charged to Vc in advance. After trigger signals are input one by one, the capacitors (C1, C2, ..., Cn) begin to discharge through switches (S1, S2, ..., Sn) sequentially into the plasma. The number of discharge pulse is decided by the number of C and S, and repetition rate equals to the frequency of input signals. The pulse width depends on the parameters of every discharge circuit such as C an d Vc etc. and can be shortened to a few ns
  • Keywords
    capacitor storage; high-frequency discharges; plasma heating; preionisation; pulse generators; pulsed power supplies; pulsed power switches; discharge circuits; high repetition rate discharge power; multipulse discharge power; plasma heating; power supply; storage capacitors; switches; Capacitors; Circuits; Heating; Plasma applications; Power supplies; Pulsed power supplies; Space vector pulse width modulation; Switches; Tin; Virtual colonoscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
  • Conference_Location
    Traverse City, MI
  • Print_ISBN
    1-4244-0125-9
  • Type

    conf

  • DOI
    10.1109/PLASMA.2006.1707031
  • Filename
    1707031