DocumentCode :
2647494
Title :
Influence of pressure on performances of mercury free signs excited with a pulsed power supply
Author :
Point, Sébastein ; Robert, Eric ; Pouvesle, Jean-Michel ; Dozias, Sébastien
Author_Institution :
GREMI, Polytech. Orleans
fYear :
2006
fDate :
4-8 June 2006
Firstpage :
195
Lastpage :
195
Abstract :
Summary form only given. The European standard 2002/96/CE imposes to remove mercury from discharge lamps, which include signs for public lighting. A possible alternative is to use a binary mixture of neon and xenon, excited with a pulsed power supply. In this work, the influence of mixture pressure on lighting performances is studied. An adapted sign is continuously flushed so that pressure and proportion of gases can be adjusted. The temporal evolution of 147 nm resonant line of xenon was recorded with a fast photomultiplier tube for different mixture pressures. In the normal range of operation, the results show that afterglow VUV emission increases together with mixture pressure. If VUV power is compared to visible light emitted by phosphors, it appears that illuminance follows variations of afterglow VUV emission essentially. Illuminance and afterglow VUV emission are both maximum for a pressure higher than usual pressure of signs containing mercury. Glow VUV emission never contributes for more than 50% to the 147 nm resonant line emission and has a lower influence on illuminance. Moreover, for pressures of interest, afterglow VUV emission and illuminance are the most intense for a specific proportion of xenon, which is quite low. In addition, the second molecular continuum of xenon has been recorded from 148 nm to 205 nm. It appears that this continuum emission increases with pressure, but also with xenon proportion, and so contributes to the excitation of phosphors. So, medium pressure mixtures with little proportions of xenon appear as an interesting orientation for the development of efficient pulsed powered mercury free signs
Keywords :
afterglows; discharge lamps; gas mixtures; neon; plasma diagnostics; plasma pressure; xenon; 147 nm; 148 to 205 nm; Ne-Xe; afterglow VUV emission; binary mixture; discharge lamps; fast photomultiplier tube; illuminance; mercury free signs; mixture pressure; phosphors; public lighting; pulsed power supply; resonant line emission; second molecular continuum; visible light; Gases; Lamps; Light sources; Phosphors; Photomultipliers; Pulsed power supplies; Resonance; Xenon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
Conference_Location :
Traverse City, MI
Print_ISBN :
1-4244-0125-9
Type :
conf
DOI :
10.1109/PLASMA.2006.1707067
Filename :
1707067
Link To Document :
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