DocumentCode :
2647877
Title :
Epitaxial Liftoff Technology For OEIC´s
Author :
Yablonovitch, E.
Author_Institution :
Navesink Research Center
fYear :
1991
fDate :
29 Jul-2 Aug 1991
Firstpage :
5
Lastpage :
6
Keywords :
Crystalline materials; Gallium arsenide; Glass; Optical materials; Optical waveguides; Optoelectronic devices; Semiconductor materials; Semiconductor thin films; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
Type :
conf
DOI :
10.1109/LEOSST.1991.638984
Filename :
638984
Link To Document :
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