Investigation of plasma irradiation spectra at the diamond like carbon films deposition

Summary form only given. For the purpose of providing thorough quality control of diamond like carbon films obtained during the plasma chemical deposition process, the spectral characteristics of plasma radiation were registered. The plasma obtained from the vapor of organic compounds (acetone, toluene, etc.) was enriched by Al ions and atoms to obtain the films with predetermined characteristics. The Al ions were included in plasma stream with the help of magnetron sputtering source located at a defined angle against the direction of main plasma stream. The interrelation between the intensity of spectral bands of Al ions or atoms with the optical and mechanical characteristics of obtained coatings was established and analyzed. The influence of plasma obtained with the help of magnetron sputtering source on the plasma stream received from organics was also discussed. It is shown that Al included in plasma stream leads to sharp increasing in electroconductivity of obtained coatings without essential worsening in transparence. Thus the method allowing the controlled obtainment of coatings possessed by predicted properties was developed. As a result diamond like carbon films with various optical and electrophysical parameters, characterized by enhanced adhesion and hardness are obtained