New probe method applicable to plasma processing

Summary form only given. A new floating type probe (FP) and its driving circuit using the nonlinear characteristics of the probe sheath was developed for electron temperature and the ion density measurement in inductively coupled plasmas (ICP). The FP was compared with a single Langmuir probe and it turned out that the FP agrees closely with the single probe at various RF powers and pressures. The ion density and electron temperature by the FP were measured with a film on the probe tip coated in CF₄ plasma. It is found that the ion density and electron temperature by the FP were almost the same regardless of the coating on the probe tip while a single Langmuir probe does not work. Because the floating type probe is hardly affected by the deposition on the probe tip, it is expected to be applied to plasma diagnostics for plasma processing such as deposition or etching