Title :
Flexible And Rigid Masks And Alignment In Binary Optics
Author :
Everett, Patrick N. ; Delaney, William F. ; Griswold, Marsden P.
Author_Institution :
Massachusetts Institute of Technology
fDate :
29 Jul-2 Aug 1991
Keywords :
Chromium; Costs; Degradation; Integrated circuit technology; Laboratories; Lithography; Resists; Shape control; Stress; Surface acoustic wave devices;
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
DOI :
10.1109/LEOSST.1991.638995