Characteristics of gas jet Z-pinch plasma light source for extreme ultraviolet lithography

Summary form only given. Development of extreme ultraviolet (EUV) light source with enough usable power and long lifetime is key problem of realizing EUV lithography. In order to overcome problems, a Z-pinch discharge light source has been made and demonstrated. In next step, for generating high quality debris-free EUV emission, a new electrode system using gas jet Z-pinch plasma has been proposed and tested. In this system, two cylindrical electrodes are set apart without a discharge tube. One of electrodes acts as a nozzle and the other as a diffuser. The generated EUV radiation from the pinched plasma between electrodes will be collected radially. In present study, EUV radiation emitted from gas jet Z-pinch Xe plasma was quantitatively measured using an in-band calorimeter. Time-integrated in-band source image measurement was also conducted using a pinhole camera system. The details of experimental results will be discussed