DocumentCode
2649423
Title
Phase control of N-type nanocrystalline diamond films deposited in microwave plasmas from methane and acetylene
Author
Ikeda, Tomohiro ; Teii, Kungen
Author_Institution
Dept. of Appl. Sci. for Electron. & Mater., Kyushu Univ., Fukuoka
fYear
2006
fDate
4-8 June 2006
Firstpage
293
Lastpage
293
Abstract
Summary form only given. Nanocrystalline diamond (NCD) film is a novel form of artificial diamond grown from highly fragmented hydrocarbons by using plasmas. The films are the composite of nanodiamond particles and amorphous carbon matrix. One of the unique properties of NCD films is n-type conductivity. In this study, the amount and composition of amorphous nondiamond phases in NCD films deposited from moderate or low-pressure microwave plasmas from CH4 and C2H2 are examined to obtain a clue to phase-pure NCD films. Also, the electrical properties of nitrogen-doped films are examined to demonstrate semiconductor properties. Visible Raman spectroscopy for NCD films with average crystallite sizes below 25 nm revealed that the amount of amorphous carbon corresponding to the D peak intensity was reduced and consequently the diamond peak was clearly observed when C2H2 was used. The electrical properties of nitrogen-doped NCD films were also examined and discussed along microstructures and phase composition of the films
Keywords
Raman spectra; crystal microstructure; crystallites; diamond; electrical conductivity; elemental semiconductors; nanostructured materials; nitrogen; plasma CVD; semiconductor doping; semiconductor thin films; visible spectra; C:N2; acetylene; amorphous carbon matrix; crystallite; fragmented hydrocarbons; methane; microstructures; microwave plasmas; n-type conductivity; n-type nanocrystalline diamond films; nanodiamond particles; phase composition; phase control; visible Raman spectroscopy; Amorphous materials; Conductive films; Conductivity; Crystallization; Hydrocarbons; Phase control; Plasma properties; Raman scattering; Semiconductor films; Spectroscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
Conference_Location
Traverse City, MI
Print_ISBN
1-4244-0125-9
Type
conf
DOI
10.1109/PLASMA.2006.1707166
Filename
1707166
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