DocumentCode
2649490
Title
Quantum-mechanical study on the electron effective mobility of surrounding-gate nMOSFETs
Author
Hu, Guang Xi ; Liu, Ran ; Tang, Ting Ao ; Wang, Ling Li ; Qiu, Zhi Jun
Author_Institution
State Key Lab. of ASIC & Syst., Fudan Univ., Shanghai, China
fYear
2009
fDate
20-23 Oct. 2009
Firstpage
792
Lastpage
795
Abstract
As metal - oxide - semiconductor field-effect transistors (MOSFETs) down scaling progresses into the nanometer regime, quantum mechanical effects are becoming more and more significant. In this work, a model for the surrounding-gate (SG) nMOSFET is developed. The Schro¿dinger equation is solved analytically and some of the results are verified via simulations. We find that the percentage of the electrons with a lighter conductivity mass increases as the temperature decreases, or as the gate voltage reduces. These imply that low temperature and low gate voltage will enhance the electron effective mobility, which is good for the device performance.
Keywords
MOSFET; Schrodinger equation; electron mobility; quantum theory; Schro¿dinger equation; conductivity mass; electron mobility; metal-oxide-semiconductor field-effect transistor; quantum-mechanical study; surrounding-gate nMOSFET; Analytical models; Conductivity; Electron mobility; FETs; MOSFETs; Quantum mechanics; RNA; Schrodinger equation; Silicon; Temperature; Field-Effect-Transistor; Metal-Oxide-Semiconductor; Mobility; Quantum-Mechanical Study;
fLanguage
English
Publisher
ieee
Conference_Titel
ASIC, 2009. ASICON '09. IEEE 8th International Conference on
Conference_Location
Changsha, Hunan
Print_ISBN
978-1-4244-3868-6
Electronic_ISBN
978-1-4244-3870-9
Type
conf
DOI
10.1109/ASICON.2009.5351286
Filename
5351286
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