DocumentCode :
2649490
Title :
Quantum-mechanical study on the electron effective mobility of surrounding-gate nMOSFETs
Author :
Hu, Guang Xi ; Liu, Ran ; Tang, Ting Ao ; Wang, Ling Li ; Qiu, Zhi Jun
Author_Institution :
State Key Lab. of ASIC & Syst., Fudan Univ., Shanghai, China
fYear :
2009
fDate :
20-23 Oct. 2009
Firstpage :
792
Lastpage :
795
Abstract :
As metal - oxide - semiconductor field-effect transistors (MOSFETs) down scaling progresses into the nanometer regime, quantum mechanical effects are becoming more and more significant. In this work, a model for the surrounding-gate (SG) nMOSFET is developed. The Schro¿dinger equation is solved analytically and some of the results are verified via simulations. We find that the percentage of the electrons with a lighter conductivity mass increases as the temperature decreases, or as the gate voltage reduces. These imply that low temperature and low gate voltage will enhance the electron effective mobility, which is good for the device performance.
Keywords :
MOSFET; Schrodinger equation; electron mobility; quantum theory; Schro¿dinger equation; conductivity mass; electron mobility; metal-oxide-semiconductor field-effect transistor; quantum-mechanical study; surrounding-gate nMOSFET; Analytical models; Conductivity; Electron mobility; FETs; MOSFETs; Quantum mechanics; RNA; Schrodinger equation; Silicon; Temperature; Field-Effect-Transistor; Metal-Oxide-Semiconductor; Mobility; Quantum-Mechanical Study;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
ASIC, 2009. ASICON '09. IEEE 8th International Conference on
Conference_Location :
Changsha, Hunan
Print_ISBN :
978-1-4244-3868-6
Electronic_ISBN :
978-1-4244-3870-9
Type :
conf
DOI :
10.1109/ASICON.2009.5351286
Filename :
5351286
Link To Document :
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