• DocumentCode
    2649490
  • Title

    Quantum-mechanical study on the electron effective mobility of surrounding-gate nMOSFETs

  • Author

    Hu, Guang Xi ; Liu, Ran ; Tang, Ting Ao ; Wang, Ling Li ; Qiu, Zhi Jun

  • Author_Institution
    State Key Lab. of ASIC & Syst., Fudan Univ., Shanghai, China
  • fYear
    2009
  • fDate
    20-23 Oct. 2009
  • Firstpage
    792
  • Lastpage
    795
  • Abstract
    As metal - oxide - semiconductor field-effect transistors (MOSFETs) down scaling progresses into the nanometer regime, quantum mechanical effects are becoming more and more significant. In this work, a model for the surrounding-gate (SG) nMOSFET is developed. The Schro¿dinger equation is solved analytically and some of the results are verified via simulations. We find that the percentage of the electrons with a lighter conductivity mass increases as the temperature decreases, or as the gate voltage reduces. These imply that low temperature and low gate voltage will enhance the electron effective mobility, which is good for the device performance.
  • Keywords
    MOSFET; Schrodinger equation; electron mobility; quantum theory; Schro¿dinger equation; conductivity mass; electron mobility; metal-oxide-semiconductor field-effect transistor; quantum-mechanical study; surrounding-gate nMOSFET; Analytical models; Conductivity; Electron mobility; FETs; MOSFETs; Quantum mechanics; RNA; Schrodinger equation; Silicon; Temperature; Field-Effect-Transistor; Metal-Oxide-Semiconductor; Mobility; Quantum-Mechanical Study;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ASIC, 2009. ASICON '09. IEEE 8th International Conference on
  • Conference_Location
    Changsha, Hunan
  • Print_ISBN
    978-1-4244-3868-6
  • Electronic_ISBN
    978-1-4244-3870-9
  • Type

    conf

  • DOI
    10.1109/ASICON.2009.5351286
  • Filename
    5351286