DocumentCode
2650115
Title
A Plasma Etching Process Module For Fabrication Of High Frequency Buried Heterostructure Lasers
Author
Meland, E. ; Holmstrom, R.P.
Author_Institution
GTE Laboratories Incorporated, 40 Sylvan Road, Waltham, MA 02254
fYear
1991
fDate
29 Jul-2 Aug 1991
Firstpage
26
Lastpage
27
Keywords
Bandwidth; Etching; Frequency; Indium phosphide; Optical device fabrication; Plasma applications; Plasma measurements; Plasma waves; Polymers; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN
0-87942-618-7
Type
conf
DOI
10.1109/LEOSST.1991.639000
Filename
639000
Link To Document