• DocumentCode
    2650192
  • Title

    Low-area 1-kb multi-bit OTP IP design

  • Author

    Jin, Li-Yan ; Kim, Tae-Hoon ; Lee, Cheon-Hyo ; Ha, Pan-Bong ; Kim, Yong-Hee

  • Author_Institution
    Dept. of Electron. Eng., Changwon Nat. Univ., Changwon, South Korea
  • fYear
    2009
  • fDate
    20-23 Oct. 2009
  • Firstpage
    629
  • Lastpage
    632
  • Abstract
    In this paper 1-kb multi-bit OTP IP, which is non-volatile memory, is designed for a power management IC. A conventional multi-bit OTP cell uses isolated NMOS transistor, but the cell size is large in the BCD process. So, PMOS transistor is used instead of the isolated NMOS transistor as antifuse, and the cell size is minimized by optimizing the size of PMOS transistor. In addition, an ESD protection circuit is added to prevent the case that any cell is programmed by high voltage at ESD test. The 1kb OTP IP is designed using Dongbu´s 0.18¿m BCD process and the layout size of the IP is 160.490 × 506.255 ¿m 21.
  • Keywords
    BiCMOS memory circuits; MOSFET; electrostatic discharge; integrated circuit layout; random-access storage; BCD process; BiCMOS-DMOS process; ESD protection circuit; PMOS transistor; antifuse; isolated NMOS transistor; layout size; multi-bit OTP IP; nonvolatile memory; Analog integrated circuits; CMOS analog integrated circuits; Circuit testing; Electrostatic discharge; Energy management; MOS devices; MOSFETs; Nonvolatile memory; Protection; Voltage; ESD protection; Multi-bit OTP; PMOS antifuse; breakdown; thin gate oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ASIC, 2009. ASICON '09. IEEE 8th International Conference on
  • Conference_Location
    Changsha, Hunan
  • Print_ISBN
    978-1-4244-3868-6
  • Electronic_ISBN
    978-1-4244-3870-9
  • Type

    conf

  • DOI
    10.1109/ASICON.2009.5351324
  • Filename
    5351324