Title :
Image Potentials And Dry Etch Directionality In Integrated Optoelectronics
Author :
Davis, Robert J. ; Tiwari, Sandip
Author_Institution :
IBM Thomas J. Watson Research Center
fDate :
29 Jul-2 Aug 1991
Keywords :
Chemical lasers; Chemical processes; Cyclotrons; Dry etching; Electrons; Gratings; Integrated optoelectronics; Ion beams; Mirrors; Waveguide lasers;
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
DOI :
10.1109/LEOSST.1991.639003
