DocumentCode
2650630
Title
Image Potentials And Dry Etch Directionality In Integrated Optoelectronics
Author
Davis, Robert J. ; Tiwari, Sandip
Author_Institution
IBM Thomas J. Watson Research Center
fYear
1991
fDate
29 Jul-2 Aug 1991
Firstpage
30
Lastpage
31
Keywords
Chemical lasers; Chemical processes; Cyclotrons; Dry etching; Electrons; Gratings; Integrated optoelectronics; Ion beams; Mirrors; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN
0-87942-618-7
Type
conf
DOI
10.1109/LEOSST.1991.639003
Filename
639003
Link To Document