DocumentCode :
2652168
Title :
Graphene for More Moore and More Than Moore applications
Author :
Lemme, M.C. ; Vaziri, S. ; Smith, A.D. ; Li, J. ; Rodriguez, S. ; Rusu, A. ; Ostling, M.
Author_Institution :
KTH R. Inst. of Technol., Kista, Sweden
fYear :
2012
fDate :
10-11 June 2012
Firstpage :
1
Lastpage :
3
Abstract :
Graphene has caught the attention of the electronic device community as a potential future option for More Moore and More Than Moore devices and applications. This is owed to its remarkable material properties, which include ballistic conductance over several hundred nanometers or charge carrier mobilities of several 100.000 cm2/Vs in pristine graphene. Furthermore, standard CMOS technology may be applied to graphene in order to make devices. Integrated graphene devices, however, are performance limited by scattering due to defects in the graphene and its dielectric environment and high contact resistance. In addition, graphene has no energy band gap and hence graphene MOSFETs (GFETs) cannot be switched off, but instead show ambipolar behaviour. This has steered interest away from logic to analog radio frequency (RF) applications. This talk will systematically compare the expected RF performance of realistic GFETs with current silicon CMOS technology. GFETs slightly lag behind in maximum cut-off frequency FT,max up to a carrier mobility of 3000 cm2/Vs, where they can achieve similar RF performance as 65nm silicon FETs. While a strongly nonlinear voltage-dependent gate capacitance inherently limits performance, other parasitics such as contact resistance are expected to be optimized as GFET process technology improves.
Keywords :
CMOS integrated circuits; MOSFET; carrier mobility; contact resistance; electrical conductivity; graphene; C; GFET process technology; RF performance; ambipolar behaviour; ballistic conductance; charge carrier mobilities; contact resistance; defects; dielectric environment; electronic device community; graphene MOSFET; high contact resistance; integrated graphene devices; logic analog radio frequency applications; maximum cut-off frequency; pristine graphene; realistic GFET; silicon CMOS technology; size 65 nm; standard CMOS technology; strongly nonlinear voltage-dependent gate capacitance; Dielectrics; Dispersion; Logic gates; Performance evaluation; Radio frequency; Silicon; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Silicon Nanoelectronics Workshop (SNW), 2012 IEEE
Conference_Location :
Honolulu, HI
ISSN :
2161-4636
Print_ISBN :
978-1-4673-0996-7
Electronic_ISBN :
2161-4636
Type :
conf
DOI :
10.1109/SNW.2012.6243322
Filename :
6243322
Link To Document :
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