Title :
Development of an RF driven plasma cathode for ion sources
Author :
Williams, M.D. ; Leung, K.N. ; Matuk, C.A. ; Wilde, S.B. ; Benveniste, V.M. ; Graf, M.A. ; Horsky, T.N. ; Saadatmand, K.
Author_Institution :
Lawrence Berkeley Nat. Lab., California Univ., Berkeley, CA, USA
Abstract :
Conventional tungsten cathode driven plasma sources are limited in the ability to provide large discharge currents and high discharge voltages for CW discharge plasmas. An RF driven plasma cathode based on the multicusp ion source technology has been developed at LBNL. It is shown that large electron currents at high discharge voltage can be achieved for CW discharge operation while maintaining very long cathode lifetime
Keywords :
cathodes; high-frequency discharges; ion sources; plasma production; CW discharge plasmas; RF driven plasma cathode; electron currents; multicusp ion source; plasma sources; Cathodes; Electrodes; Fault location; Ion sources; Magnets; Plasma confinement; Plasma immersion ion implantation; Plasma sources; Radio frequency; Voltage;
Conference_Titel :
Particle Accelerator Conference, 1997. Proceedings of the 1997
Conference_Location :
Vancouver, BC
Print_ISBN :
0-7803-4376-X
DOI :
10.1109/PAC.1997.752759
