DocumentCode :
2654357
Title :
Etch Resistance Of Focused-ion-beam-implanted SiO2
Author :
Geil, Bruce ; Merritt, Scott ; Simonis, George ; Dagenais, Mario
Author_Institution :
Harry Diamond Laboratories
fYear :
1991
fDate :
29 Jul-2 Aug 1991
Firstpage :
66
Lastpage :
67
Keywords :
Etching; Hafnium; Ion beams; Lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
Type :
conf
DOI :
10.1109/LEOSST.1991.639022
Filename :
639022
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2654357
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