Title :
Self-aligned Si-Zn Diffusion For Impurity-induced Disordering Lasers: Extremely Low Threshold And High Yield
Author :
Zou, W.X. ; Merz, J.L. ; Fu, R.J. ; Hong, C.S.
Author_Institution :
University of California, Santa Barbara,CA93106, 805-893-8465
fDate :
29 Jul-2 Aug 1991
Keywords :
Electrons; Etching; Laser modes; Lasers and Electro-Optics Society; Leakage current; Optical device fabrication; P-n junctions; Testing; Threshold current; USA Councils;
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
DOI :
10.1109/LEOSST.1991.639026
