Title :
Electromigration-dependent parametric yield estimation
Author :
Barsky, Roman ; Wagner, Israel A.
Author_Institution :
Dept. of Comput. Sci., Technion-Israel Inst. of Technol., Haifa, Israel
Abstract :
We define and investigate the problem of electromigration faults caused by spot defects during the VLSI manufacturing process. Analysis is given for a simple layout, and simulations are presented and discussed for a more complicated case. It is shown that in some cases, electromigration-dependent parametric faults can make a significant contribution to the total yield estimation.
Keywords :
VLSI; electromigration; integrated circuit yield; VLSI manufacturing process; electromigration faults; electromigration-dependent parametric faults; parametric yield estimation; spot defects; total yield estimation; Analytical models; Circuit faults; Computational modeling; Computer science; Electromigration; Frequency estimation; Manufacturing processes; Very large scale integration; Wire; Yield estimation;
Conference_Titel :
Electronics, Circuits and Systems, 2004. ICECS 2004. Proceedings of the 2004 11th IEEE International Conference on
Print_ISBN :
0-7803-8715-5
DOI :
10.1109/ICECS.2004.1399629
