Title :
Efficient 13.5 nm EUV generation from a laser plasma
Author :
Richardson, M. ; Koay, C.-S. ; Takenoshita, K. ; George, S. ; Bernath, R. ; Al-Rabban, M.M. ; Bakshi, V.
Author_Institution :
Coll. of Opt. & Photonics, Univ. of Central Florida, Orlando, FL, USA
Abstract :
We describe a source of 13.5 nm radiation, based on multi-kHz laser-plasmas created from tin-bearing micro-droplets that has a high probability of satisfying the requirements for EUVL, the next generation lithography for computer chip fabrication.
Keywords :
light sources; plasma confinement; plasma production by laser; plasma sources; tin; ultraviolet lithography; 13.5 nm; EUV generation; Sn; computer chip fabrication; laser plasma; lithography; radiation source; tin-bearing microdroplets; Atmospheric measurements; Bandwidth; Laser theory; Optical computing; Physics computing; Plasma measurements; Plasma properties; Plasma sources; Ultraviolet sources; X-ray lasers;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2005. QELS '05
Print_ISBN :
1-55752-796-2
DOI :
10.1109/QELS.2005.1549337
