DocumentCode
2656139
Title
Copper substrate transfer technology for silicon RF circuits
Author
Dekker, R. ; Timmering, C.E.
Author_Institution
Philips Res. Labs., Eindhoven, Netherlands
fYear
2003
fDate
28-30 Sept. 2003
Firstpage
31
Lastpage
34
Abstract
We present exploratory experiments on the waferscale transfer of silicon RF circuits to copper substrates. This approach allows for a well defined microstrip transmission line interconnect and a perfect electrical and thermal grounding. Freestanding stress-free 6-inch transferred copper substrates are demonstrated and RF measurements on passive microstrip transmission lines are presented. Additionally, we present a new method enabling the dicing of these copper substrates. In conclusion copper substrate transfer technology is attractive for circuits operating at microwave frequencies as well as for demanding applications at lower frequencies such as RF power transistors for mobile communication.
Keywords
copper; elemental semiconductors; integrated circuit design; integrated circuit interconnections; microstrip lines; microwave integrated circuits; silicon; 6 in; RF circuits; RF measurements; RF power transistors; Si; copper substrate transfer technology; electrical grounding; microstrip transmission line interconnect; microwave frequencies; mobile communication; passive microstrip transmission lines; substrates dicing; thermal grounding; waferscale transfer; Copper; Integrated circuit design; Integrated circuit interconnections; Microstrip; Microwave integrated circuits; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting, 2003. Proceedings of the
ISSN
1088-9299
Print_ISBN
0-7803-7800-8
Type
conf
DOI
10.1109/BIPOL.2003.1274929
Filename
1274929
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