Polymer coated thin film plate acoustic resonators (FPAR) for gas sensing applications

Author

Arapan, L. ; Katardjiev, I. ; Yantchev, V. ; Alexieva, G. ; Strashilov, V. ; Avramov, I.D. ; Radeva, E.

Author_Institution

Dept. Solid State Electron., Uppsala Univ., Uppsala, Sweden

fYear

2011

fDate

2-5 May 2011

Firstpage

1

Lastpage

5

Abstract

Mass sensitivity of thin aluminum nitride (AlN) film S0 plate wave resonators is theoretically and experimentally studied. Here, two-port 888MHz synchronous thin film plate acoustic resonators (FPAR) are micromachined and subsequently coated with plasma-polymerized hexamethyldisiloxane (pp-HMDSO) thin films of various thicknesses. Systematic data on frequency shift and insertion loss versus film thickness are presented in a comparative manner. Measurements in gas phase environment are further presented in a comparative manner.

Keywords

III-V semiconductors; aluminium compounds; gas sensors; micromachining; microsensors; polymers; surface acoustic wave resonators; wide band gap semiconductors; AlN; FPAR; frequency 888 fHz; gas sensing application; mass sensitivity; micromachining; plasma polymerized hexamethyldisiloxane; polymer coated thin film plate acoustic resonators; pp-HMDSO thin films; two-port synchronous thin film plate acoustic resonators; Films; Polymers; Resonant frequency; Sensitivity; Sensors; Surface acoustic waves;

fLanguage

English

Publisher

ieee

Conference_Titel

Frequency Control and the European Frequency and Time Forum (FCS), 2011 Joint Conference of the IEEE International

Conference_Location

San Fransisco, CA

ISSN

1075-6787

Print_ISBN

978-1-61284-111-3

Type

conf

DOI

10.1109/FCS.2011.5977282

Filename

5977282