DocumentCode :
2657252
Title :
High thermally conductive and high reliability under-fill
Author :
Abe, Yukinari ; Yamada, Kazuyoshi ; Abe, Nobuyuki ; Tanaka, Fumio ; Fujiki, Tatsuhiro
Author_Institution :
NAMICS Corp., Niigata
fYear :
2006
fDate :
27-28 June 2006
Firstpage :
179
Lastpage :
181
Abstract :
The miniaturization of flip-chip package is examined in many manufacturers. A thermal conductivity of underfill material has been regarded as important. Silica is contained in conventional under-fill as filler. Thermal conductivity of under-fill which contains silica filler is around 0.4W/mK. More than 1 W/mK of thermal conductivity is required for high thermally conductive under-fill. However, it is difficult to confirm if thermal conductivities are more than 1W/mK when silica is chosen as filler, since thermal conductivity of silica is about 1.3 W/mK. The various kinds of aluminum nitride were examined. High thermally conductive under-fill has been developed. It is filled with fine particle size aluminum nitride which will provide high thermal conductivity and good fluidity. And this under-fill realized over 2W/mK of thermal conductivity by control of loading level of the aluminum nitride filler. Also, this product satisfies the basic requirements for the under-fill, such as the JEDEC level 3 preconditioning test and temperature cycle test
Keywords :
filler metals; flip-chip devices; reliability; thermal conductivity; aluminum nitride; flip-chip package; temperature cycle test; thermal conductivity; underfill materials; Adhesives; Aluminum nitride; Conducting materials; Microelectronics; Packaging; Semiconductor device measurement; Silicon compounds; Space technology; Testing; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06. Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0488-6
Type :
conf
DOI :
10.1109/HDP.2006.1707590
Filename :
1707590
Link To Document :
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