• DocumentCode
    2657265
  • Title

    Fin flash memory cells with separated double gates

  • Author

    Jang-Gn Yun ; Yoon Kim ; Il Han Park ; Seongjae Cho ; Jung Hoon Lee ; Doo-Hyun Kim ; Gil Sung Lee ; Dong Hua Lee ; Se Hwan Park ; Wonbo Shim ; Jong-Duk Lee ; Byung-Gook Park

  • Author_Institution
    Inter-univ. Semicond. Res. Center & Sch. of Electr. Eng., Seoul
  • fYear
    2007
  • fDate
    12-14 Dec. 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    4-bit/cell devices have been studied to increase the flash memory density using multi-bit operation [1] or both multi-bit and multi-level concepts at the same time [2]. Moreover, physically isolated two charge storage nodes combined with the non-conductive charge trapping layers give an opportunity to achieve even 8-bit/cell operation [3]. In this paper, separated double-gate fin flash memory devices with multi-bit and multi-level operation are investigated. Four different operation modes are introduced for this cell and their operation is demonstrated with the 3-D device simulation
  • Keywords
    flash memories; integrated circuit modelling; 3D device simulation; charge storage nodes; flash memory cells; nonconductive charge trapping layers; Dielectrics; Educational institutions; Flash memory; Flash memory cells; Gas insulated transmission lines; Implants; Interference; Planarization; SONOS devices; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2007 International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-1892-3
  • Electronic_ISBN
    978-1-4244-1892-3
  • Type

    conf

  • DOI
    10.1109/ISDRS.2007.4422287
  • Filename
    4422287