Title :
Fin flash memory cells with separated double gates
Author :
Jang-Gn Yun ; Yoon Kim ; Il Han Park ; Seongjae Cho ; Jung Hoon Lee ; Doo-Hyun Kim ; Gil Sung Lee ; Dong Hua Lee ; Se Hwan Park ; Wonbo Shim ; Jong-Duk Lee ; Byung-Gook Park
Author_Institution :
Inter-univ. Semicond. Res. Center & Sch. of Electr. Eng., Seoul
Abstract :
4-bit/cell devices have been studied to increase the flash memory density using multi-bit operation [1] or both multi-bit and multi-level concepts at the same time [2]. Moreover, physically isolated two charge storage nodes combined with the non-conductive charge trapping layers give an opportunity to achieve even 8-bit/cell operation [3]. In this paper, separated double-gate fin flash memory devices with multi-bit and multi-level operation are investigated. Four different operation modes are introduced for this cell and their operation is demonstrated with the 3-D device simulation
Keywords :
flash memories; integrated circuit modelling; 3D device simulation; charge storage nodes; flash memory cells; nonconductive charge trapping layers; Dielectrics; Educational institutions; Flash memory; Flash memory cells; Gas insulated transmission lines; Implants; Interference; Planarization; SONOS devices; Tunneling;
Conference_Titel :
Semiconductor Device Research Symposium, 2007 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-1892-3
Electronic_ISBN :
978-1-4244-1892-3
DOI :
10.1109/ISDRS.2007.4422287