Title :
Impact of nano particles on semiconductor manufacturing
Author :
Wali, F. ; Knotter, D.M. ; Kuper, F.G.
Author_Institution :
Fac. of Electr. Eng., Univ. of Twente, Nijmegen, Netherlands
Abstract :
Semiconductor industry faces a continuous challenge to decrease the transistor size as well as to increase the yield by eliminating defect sources. One of the sources of particle defects is ultra pure water used in different production tools at different stages of processing. In this paper, particle count data measured in ultra pure water is related to the yield of two large size products. An impact of nanoparticle present in ultra pure water on yield of up to 4-6 % has been found in two different products.
Keywords :
contamination; nanoparticles; particle counting; regression analysis; semiconductor industry; semiconductor technology; transistors; defect density; nanoparticles; particle contamination; particle count; production tools; semiconductor manufacturing; Contamination; Electronics industry; Integrated circuit yield; Monitoring; Particle measurements; Pollution measurement; Semiconductor device manufacture; Size measurement; Water pollution; Water resources; Defect density; Linear regression; Particle contamination; Yield; component;
Conference_Titel :
Multitopic Conference, 2008. INMIC 2008. IEEE International
Conference_Location :
Karachi
Print_ISBN :
978-1-4244-2823-6
Electronic_ISBN :
978-1-4244-2824-3
DOI :
10.1109/INMIC.2008.4777715
