• DocumentCode
    2658247
  • Title

    Wire drawing tool for IC and MEMS CAD optimized for creating and editing wires on multiples of 45 degrees

  • Author

    Doering, Roger W. ; Arnaiz, C.I. ; Nakagawa, M.

  • Author_Institution
    California State Univ., East Bay
  • fYear
    2007
  • fDate
    12-14 Dec. 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    This software tool is a part of a research project developing a mask layout tool at CSU East Bay. Wires drawn at any angle may be drawn with most modern layout tools.
  • Keywords
    circuit layout CAD; integrated circuit layout; MEMS CAD; integrated circuit layout; mask layout tool; wire drawing tool; Computer science; Education; Educational institutions; Graphics; Integrated circuit layout; Mathematics; Micromechanical devices; Size control; Software tools; Wire drawing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2007 International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-1892-3
  • Electronic_ISBN
    978-1-4244-1892-3
  • Type

    conf

  • DOI
    10.1109/ISDRS.2007.4422339
  • Filename
    4422339
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2658247