DocumentCode
2658730
Title
Breakdown effects on MOS varactors and VCOs
Author
Sadat, Anwar ; Yang, Hong ; Xiao, Enjun ; Yuan, Jiann S.
Author_Institution
Chip Design & Reliability Lab., Central Florida Univ., Orlando, FL, USA
fYear
2003
fDate
4-8 May 2003
Firstpage
556
Lastpage
559
Abstract
The gate oxide breakdown effects of deep sub-micron devices, which degrade the performance of MOS varactors that in turn degrade the performance of LC voltage controlled oscillators (VCOs), are presented. On wafer 0.16 μm CMOS devices are stressed; experimental data are analyzed and used for analytical derivations and simulations to show that the breakdown has twofold effects on the performance of the VCOs. Firstly, the increased conductance of the varactor degrades its quality, which increases the phase noise of the VCOs. This also reduces the amplitude at the output of the oscillator. Secondly, the value of the capacitance of the MOS varactor reduces, which shifts the oscillation frequency of the VCOs.
Keywords
MOS capacitors; phase noise; semiconductor device breakdown; semiconductor device noise; varactors; voltage-controlled oscillators; 0.16 micron; CMOS devices; MOS varactors; VCO; capacitance; complementary metal oxide semiconductor devices; conductance; deep submicron devices; gate oxide breakdown effects; metal oxide semiconductor varactors; oscillation frequency; phase noise; voltage controlled oscillators; Analytical models; Breakdown voltage; Capacitance; Data analysis; Degradation; Electric breakdown; Performance analysis; Phase noise; Varactors; Voltage-controlled oscillators;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium and PDA Exhibition Jointly with the 17th European Frequency and Time Forum, 2003. Proceedings of the 2003 IEEE International
ISSN
1075-6787
Print_ISBN
0-7803-7688-9
Type
conf
DOI
10.1109/FREQ.2003.1275151
Filename
1275151
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