DocumentCode :
2660051
Title :
Characteristics of 1.3-μm Quantum Dots Laser with a High Density and a High Uniformity QD
Author :
Amano, T. ; Sugaya, T. ; Komori, K.
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. & Technol., Ibaraki
fYear :
0
fDate :
0-0 0
Firstpage :
69
Lastpage :
70
Abstract :
In this paper, we report the characteristics of a high density QD laser. In this report, we have realized high density (7.2times1011 cm and high uniformity (25 meV) QD. Also, we have demonstrated a large modal gain of 54 cm-1 at a grand state emission of beyond 1.3 mum. It is concluded that the proposed high density and high uniformity InGaAs QD fabrication method using GC-SRL and As2 source becomes a break through technique of QD laser
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; laser beams; quantum dot lasers; semiconductor quantum dots; 1.3 micron; 25 meV; As2; InGaAs; QD; arsenic source; gradient-composition-strain reducing layer; modal gain; quantum dots fabrication method; quantum dots laser; state emission; Coatings; Gallium arsenide; Indium gallium arsenide; Laser theory; Mirrors; Quantum dot lasers; Temperature; Threshold current; US Department of Transportation; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Laser Conference, 2006. Conference Digest. 2006 IEEE 20th International
Conference_Location :
Kohala Coast, HI
Print_ISBN :
0-7803-9560-3
Type :
conf
DOI :
10.1109/ISLC.2006.1708090
Filename :
1708090
Link To Document :
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