DocumentCode :
2660219
Title :
Enhancement of hole mobility due to confinement in small diameter [110] silicon nanowires
Author :
Buin, A.K. ; Verma, A. ; Anantram, M.P.
Author_Institution :
Waterloo Univ., Waterloo
fYear :
2007
fDate :
12-14 Dec. 2007
Firstpage :
1
Lastpage :
2
Abstract :
We present results on a detailed computation of electron and hole low-field mobility for [110] axially oriented free standing SiNWs with diameters up to 3.1 nm and at various temperatures, where the principal charge scattering mechanism is through acoustic phonons, and both confined and bulk phonons are considered. The band structure for these SiNWs is determined by using a sp3d5s* TB scheme and the confined acoustic phonon dispersion for each SiNW is obtained by solving the elastic continuum wave equation. Bulk phonon dispersion is considered to be linear and a Debye cut-off energy is used to define the domain of bulk phonon wavevectors. Electron and hole - acoustic phonon scattering rates are calculated from the first order perturbation theory and deformation potential scattering, where TB electron and hole wavefunctions are incorporated. Finally, low-field mobility values are determined through momentum relaxation time approximation, and confirmed for electron-confined phonon interaction through ensemble Monte Carlo simulations.
Keywords :
carrier relaxation time; electron mobility; electron-phonon interactions; elemental semiconductors; hole mobility; nanowires; perturbation theory; phonon dispersion relations; silicon; Debye cut-off energy; Si; [110] silicon nanowires; band structure; bulk phonon dispersion; bulk phonon wavevectors; charge scattering mechanism; confined acoustic phonon dispersion; deformation potential scattering; elastic continuum wave equation; electron low-field mobility; electron-confined phonon interaction; ensemble Monte Carlo simulations; first order perturbation theory; hole low-field mobility; hole mobility enhancement; momentum relaxation time approximation; sp3d5s* TB scheme; Acoustic scattering; Carrier confinement; Charge carrier processes; Effective mass; Electron mobility; Nanowires; Phonons; Scattering parameters; Silicon; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2007 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-1891-6
Electronic_ISBN :
978-1-4244-1892-3
Type :
conf
DOI :
10.1109/ISDRS.2007.4422449
Filename :
4422449
Link To Document :
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