• DocumentCode
    2660354
  • Title

    The ultimate MOSFET and the limits of miniaturization

  • Author

    Lundstrom, Mark

  • Author_Institution
    Purdue Univ., West Lafayette
  • fYear
    2007
  • fDate
    12-14 Dec. 2007
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    After forty years of progress in integrated circuit technology, microelectronics is undergoing a transformation to nanoelectronics. Modern MOSFETs have channel lengths of less than 50 nm, and billion transistor logic chips have arrived. An intensive effort is underway across the world to push MOSFET as short as possible. What are the practical and fundamental limits to MOSFET scaling? To address these questions, we need a sound, conceptual understanding of the nanoscale MOSFET. The conceptual framework that we still use to understand FETs is remarkably similar to the one developed over 40 years ago. In this talk, the author argues that to really understand nanoscale FETs, we should complement traditional FET theory with a new approach. He focuses on the nanoscale MOSFET and describe a very simple but very sound way to understand the device. He examined the practical limits of MOSFETs, whether changing from silicon to something else would change those limits, and whether novel structures, such as nanowire and nanotube MOSFETs, can help. Finally, the fundamental limits of MOSFETs will be identified and the question: "Is there anything better than a silicon MOSFET for digital electronics?" is addressed.
  • Keywords
    MOSFET; nanotechnology; FET theory; MOSFET miniaturization; MOSFET scaling; digital electronics; integrated circuit technology; metal-oxide-semiconductor field effect transistor; microelectronics; nanoelectronics; nanoscale MOSFET; transistor logic chip; Computer networks; Educational institutions; Engineering profession; FETs; Integrated circuit technology; MOSFET circuits; Microelectronics; Nanoelectronics; Nanoscale devices; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2007 International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-1892-3
  • Electronic_ISBN
    978-1-4244-1892-3
  • Type

    conf

  • DOI
    10.1109/ISDRS.2007.4422458
  • Filename
    4422458