DocumentCode
2660650
Title
TiN coating of accelerator beamline chambers
Author
Leung, K.N. ; Lee, Y. ; Mashaw, A. ; Wutte, D. ; Gough, R.A.
Author_Institution
Lawrence Berkeley Lab., CA, USA
Volume
3
fYear
1997
fDate
12-16 May 1997
Firstpage
3737
Abstract
A titanium nitride (TiN) coating can reduce multipactoring problems in vacuum cavities and also reduce photoemission electrons from beam-pipe surfaces. A new technique is being explored at LBNL that will allow an efficient way to coat differently-shaped surfaces with TiN. In this technique, an RF-induction discharge with an exposed Ti induction antenna is employed. Tests are being performed using Ar, N, and a mixture of Ar-N gases. It is found that the characteristics of the TiN coating depends on the processing time and the gas that forms the discharge plasma
Keywords
beam handling equipment; coating techniques; high-frequency discharges; plasma applications; titanium compounds; Ar; N; RF-induction discharge; Ti induction antenna; TiN; TiN coating; accelerator; beamline chambers; discharge plasma; multipactoring; processing time; Argon; Coatings; Electron beams; Gases; Performance evaluation; Photoelectricity; Surface discharges; Testing; Tin; Titanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 1997. Proceedings of the 1997
Conference_Location
Vancouver, BC
Print_ISBN
0-7803-4376-X
Type
conf
DOI
10.1109/PAC.1997.753402
Filename
753402
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